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Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy
ISBN: 978-1-901019-04-9
Perspectives on XPS and AES
David Briggs and John T. Grant
Specimen Preparation and Handling
Joseph Geller
XPS: Instrumentation and Performance
Ian W. Drummond
Instrument Calibration for AES and XPS
Martin P. Seah
Analysing Insulators with XPS and AES
Michael A. Kelly
Beam Effects During AES and XPS Analysis
Don R. Bear, Dan J. Gaspar, Mark H. Engelhard and A.Scott Lea
Electron Transport in solids
Wolfgang S. M. Werner
Electron Attenuation Lengths
Shigeo Tanuma
Quantification in AES and XPS
Martin P. Seah
The Use of Chemometrics in AES and XPS Data Treatment
William F. Stickle
Chemical Effects in XPS
Laszlo KoÖver
Chemical Information from Auger Lineshapes
David E. Ramaker
The Auger Parameter
Giuliano Moretti
Valence Bands Studied by XPS
Peter M.A. Sherwood
Electron Backscattering and Channelling
Ding Ze-jun and Ryuichi Shimizu,
Sputter Depth Profiling in AES and XPS
Thomas Wagner, Jiang Y. Wang and Siegfried Hofmann
XPS Imaging
Kateryna Artyushkova and Julia E. Fulghum
Positron-Annihilation-Induced Auger electron Spectroscopy
Toshiyuki Ohdaira and Ryoichi Suzuki
Electron Coincidence Measurements
Stephen M. Thurgate
Comparing Beam Damage Rates Using Susceptibility Tables
D.R. Baer, M.H Engelhard, A.S. Lea and D.J. Gaspar
Databases
John T. Grant
Internet Resources
John T. Grant